Laser Writing Block Copolymer Self-Assembly on Graphene Light-Absorbing Layer.
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|---|---|
| Abstract | 
   :  
              Recent advance of high-power laser processing allows for rapid, continuous, area-selective material fabrication, typically represented by laser crystallization of silicon or oxides for display applications. Two-dimensional materials such as graphene exhibit remarkable physical properties and are under intensive development for the manufacture of flexible devices. Here we demonstrate an area-selective ultrafast nanofabrication method using low intensity infrared or visible laser irradiation to direct the self-assembly of block copolymer films into highly ordered manufacturing-relevant architectures at the scale below 12 nm. The fundamental principles underlying this light-induced nanofabrication mechanism include the self-assembly of block copolymers to proceed across the disorder-order transition under large thermal gradients, and the use of chemically modified graphene films as a flexible and conformal light-absorbing layers for transparent, nonplanar, and mechanically flexible surfaces.  | 
        
| Year of Publication | 
   :  
              2016 
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| Journal | 
   :  
              ACS nano 
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| Volume | 
   :  
              10 
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| Issue | 
   :  
              3 
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| Number of Pages | 
   :  
              3435-42 
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| Date Published | 
   :  
              2016 
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| ISSN Number | 
   :  
              1936-0851 
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| URL | 
   :  
              https://doi.org/10.1021/acsnano.5b07511 
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| DOI | 
   :  
              10.1021/acsnano.5b07511 
           | 
        
| Short Title | 
   :  
              ACS Nano 
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